Dr. Sabita Roy
Applications Development Engg
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | 1 April 2005
JM3 Vol. 4 Issue 02
KEYWORDS: Optical proximity correction, Diffractive optical elements, Critical dimension metrology, Calibration, Photomasks, Stanford Linear Collider, Fiber optic illuminators, Lithography, Printing, Logic

Proceedings Article | 3 May 2004 Paper
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Logic, Diffractive optical elements, Calibration, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Stanford Linear Collider, Fiber optic illuminators

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Cadmium, Computer programming, Printing, Monte Carlo methods, Process control, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 30 July 2002 Paper
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Reticles, Scattering, Manufacturing, Printing, Photomasks, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, Model-based design, Resolution enhancement technologies

Proceedings Article | 16 July 2002 Paper
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Lithography, Lithographic illumination, Scattering, Scanners, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing, Edge roughness

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