Dr. Sabrina Aliyeva
at Synopsys Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Metrology, Data modeling, Calibration, Etching, Scanning electron microscopy, Neural networks, Photomasks, Statistical modeling, Process modeling

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