Dr. Sachiko Kobayashi
Senior Specialist at Toshiba Memory Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (24)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Design for manufacturing, Source mask optimization, Optical proximity correction, High volume manufacturing, Nanoimprint lithography, Photoresist processing, Process modeling

PROCEEDINGS ARTICLE | March 31, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Nanotechnology, Lithography, Optical microscopes, Optical lithography, Ultraviolet radiation, Design for manufacturing, Artificial intelligence, Double patterning technology, Nanoimprint lithography, Photoresist processing, Scatter measurement, Nanolithography, UV optics, Design for manufacturability

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Backscatter, Solids, Photomasks, Beam shaping, Nanoimprint lithography, Data conversion, Photoresist processing

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Polymethylmethacrylate, Computational modeling, Silicon, Oxygen, Scanning electron microscopy, Directed self assembly, Immersion lithography, Reactive ion etching

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Ultraviolet radiation, Computer simulations, Design for manufacturing, Double patterning technology, Computational lithography, Nanoimprint lithography, Photoresist processing, Optics manufacturing, Nanolithography, Design for manufacturability

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Ultraviolet radiation, Manufacturing, Design for manufacturing, Directed self assembly, Source mask optimization, Computational lithography, Photoresist processing

Showing 5 of 24 publications
Conference Committee Involvement (7)
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Showing 5 of 7 published special sections
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