Ms. Sachiko Yabe
at SELETE
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Monochromatic aberrations, Metals, Copper, Resistance, Measurement devices, Optical proximity correction, Neodymium, Semiconducting wafers, Overlay metrology, Personal protective equipment

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Semiconductors, Lithography, Metrology, Metals, Reflectivity, Control systems, Measurement devices, Critical dimension metrology, Semiconducting wafers, Overlay metrology

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