Sachin Deo
at Univ of Tennessee
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 10 September 2007
Proc. SPIE. 6648, Instrumentation, Metrology, and Standards for Nanomanufacturing
KEYWORDS: Electron beam lithography, Electron beams, Metrology, Calibration, Silicon, Scanning electron microscopy, Raster graphics, Semiconducting wafers, Standards development, Diffraction gratings

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Semiconductors, Electron beam lithography, Electron beams, Metrology, Calibration, Silicon, Hydrogen, Scanning electron microscopy, Line edge roughness, Standards development

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Signal to noise ratio, Electron beam lithography, Fourier transforms, Image resolution, Interference (communication), Image analysis, Scanning electron microscopy, Image enhancement, Spatial resolution, Zone plates

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