We report on using e-beam lithographically technology for enabling the mass replication of custom-designed
and prepared Nano-structures via establishing nanoimprint processes for pattern transfer into UV curable prepolymes.
By EBL, the new nano-fabrication technology based on the concept of disposal master technology (DMT) is suitable for mass volume manufacturing of large area arrays of sub-wavelength photonic elements. We will present some kinds of PhC and waveguides for fabrication of nanoimprint Electron beam lithography stamps.
The ability of fabrication structure in nano-scale with high precise has established technologies like
nanoimprinting via hard stamps, where the stamps are usually produced via Electron Beam Lithography (EBL)
for applications in the microelectronic industry. On the other hand, nanopatterning with self ordered structures
or via holographic patterns provide the basis for large area imprints.
In this work we report on a technology for enabling the mass replication of custom-designed and e-beam
lithographically prepared structures for pattern transfer into UV curable pre-polymers. The new nano-fabrication
technology is based on the concept of Disposal Master Technology (DMT) capable of patterning areas up to 1 x
1 m2 and is suitable for mass volume manufacturing of large area arrays of sub-wavelength photonic elements.
As an example to show the potential of the application of the new nanoimprint technologies, we choose the
fabrication of a photonic crystal (PhC) structure with integrated light coupling devices for low loss
interconnection between PhC light wave circuits and optical fiber systems. In experiment we use 260nm of
positive resist 950K PMMA for EBL exposure. Resist thickness, exposure dose, development time and
parameter for etching have been optimized and a photonic crystal of air-holes in silicon was fabricated, then use this sample as master stamp to fabricate imprinted photonic crystal on UV curable resist.
The quest for mass replication has established technologies like nanoimprinting via hard stamps or PDMS stamps, where the stamps are usually produced via Electron Beam Lithography (EBL) for applications in the microelectronic industry. On the other hand, nanopatterning with self ordered structures1 or via holographic patterns provide the basis for large area imprints for applications for example, antireflection coatings based on biomimetic
motheyes2. In this work we report on a technology for enabling the mass replication of custom-designed and e-beam lithographically prepared structures via establishing novel roll to roll nanoimprint processes for pattern transfer into UV curable pre-polymers. The new nano-fabrication technology is based on the concept of Disposal Master Technology (DMT) capable of patterning areas up to 1 x 1 m2 and is suitable for mass volume manufacturing of large area arrays of sub-wavelength photonic elements. As an example to show the potential of the application of the new nanoimprint technologies, we choose the fabrication of a photonic crystal (PhC) structure with integrated light coupling devices for low loss interconnection between PhC lightwave circuits and optical fibre systems. We present two methods for fabrication of nanoimprint lithography stamps in Si substrate. In the first method optimized electron beam lithography (EBL) and lift-off patterning of a 15-nm thick Cr mask, and then the pattern transfer into Si using reacting ion etching (RIE) with SF6 as etch gas. In the first method, we use 200nm of positive resist PMMA 950K for EBL exposure. In this method, resist thickness, exposure dose, development time and parameter for etching have been optimized and a photonic crystal of Si-rods in air was fabricated. In the second method lift-off has not been performed and metal mask has been used as master. The subsequent steps for fabricating the master will be presented in detail.
The Local Density of photonic States (LDOS) and Multiple Multipole Expansion technique (MME) are powerful tools in the study of spontaneous emission and calculation of photon confinement as well as efficient calculation of stationary field in planar photonic crystals. We bridge between optimization of Purcell factor and Q-factor in photonic crystal micro-cavities on one hand, and cavity power loss on the other hand. The quality factor calculated through a pulse response technique based on Finite Difference Time Domain (FDTD) simulations are compared with quality factor calculated by other approaches of LDOS and power loss. It turned out that the latter methods are more accurate and computationally less expensive. The cavity power loss is defined as the surface integration of energy density flow projected toward outside of the effective cavity volume. It is shown that size changes and shifting the neighboring rods or holes have a large impact on the mode volume and confinement. The quality factor optimization is performed for a H1- photonic crystal cavity, and mode volume investigations carried out for high Q factor arrangements. These investigations are resulted in effective structural design rules and geometrical freedom contour plots for the neighboring rods in the vicinity of the micro-cavity. These generalized design rules are suitable for further studies in other photonic micro-cavities.
A sealed CuBr laser was designed and constructed. He and Ne were used as buffer gases; it is found that, under the same experimental conditions, the output power of laser increased significantly using Ne than He. We have also added a small amount of hydrogen in the tube, which generated excitation Pulses from 15 kHz. The influence of pulse repetition frequency (PRY) on the laser output power was studied. We have varied the PRF between 10 to 30 kHz by a control circuit and laser output power curve versus frequency has been achieved. The optimum frequency was obtained for maximum laser power. A minimum was obtained on the output power of laser versus PRF which can be attributed to acoustic frequencies of CuBr container structure. Maximum efficiency of this laser was about 0.8%.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.