Salman Mokhlespour
at Technische Univ Eindhoven
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes

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