Sam Sivakumar
Director of Lithography at Intel Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Stereolithography, Lithography, Optical lithography, Photomasks, FT-IR spectroscopy, Data modeling, Resolution enhancement technologies, Reticles, Model-based design, Photoresist materials

Conference Committee Involvement (8)
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Optical Microlithography XXV
14 February 2012 | San Jose, California, United States
Optical Microlithography XXIV
1 March 2011 | San Jose, California, United States
Showing 5 of 8 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top