Sam Sivakumar
Director of Lithography at Intel Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (2)

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Optical lithography, Scanners, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Yield improvement

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Reticles, FT-IR spectroscopy, Optical lithography, Data modeling, Photoresist materials, Photomasks, Stereolithography, Model-based design, Resolution enhancement technologies

Conference Committee Involvement (8)
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Optical Microlithography XXV
14 February 2012 | San Jose, California, United States
Optical Microlithography XXIV
1 March 2011 | San Jose, California, United States
Showing 5 of 8 published special sections
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