Dr. Sami Musa Profile

Dr. Sami Musa

CEO at Chilas BV

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Publications (5)

Proceedings Article | 11 March 2024 Presentation + Paper

High-power 150 mW extended cavity Si3N4 tunable narrow-linewidth laser

Albert van Rees, Wilson Tsong, Ian van den Vlekkert, Fathema Farjana, Rob E. Lammerink, Ilka Visscher, Chris G. Roeloffzen, Sami Musa, Dimitri Geskus

Proceedings Volume 12892, 128920J (2024) https://doi.org/10.1117/12.3003689

KEYWORDS: Laser frequency, Tunable lasers, Laser resonators, Waveguides, Silicon, Semiconductor lasers, Photonic integrated circuits, High power lasers, Reflection, Silicon nitride

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Proceedings Article | 17 March 2023 Presentation + Paper

>20 dB phase noise reduction by locking an off-the-shelf external cavity laser having sub-kHz linewidth to an on-chip wavelength reference in Si3N4 using an electronic feedback loop on the diode injection current

Dimitri Geskus, Tommie F. Verouden, Wilson Tsong, Arjan Meijerink, Ian van den Vlekkert, Sami Musa

Proceedings Volume 12425, 124250F (2023) https://doi.org/10.1117/12.2668707

KEYWORDS: Laser stabilization, Semiconductor lasers, Modulation, Feedback loops, Diodes, Laser frequency, Denoising, Photonic integrated circuits, Electronic circuits, Tunable lasers

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Proceedings Article | 17 March 2023 Presentation + Paper

139 nm tuning range, high speed wavelength modulation, and high output power up to 60 mW from a single gain, two-ring vernier external cavity laser

Wilson Tsong, Ian van den Vlekkert, Sami Musa, Raimond Frentrop, Noor Schilder, Marcel Hoekman, Arjan Meijerink, Edwin Klein, Dimitri Geskus

Proceedings Volume 12424, 124240G (2023) https://doi.org/10.1117/12.2650624

KEYWORDS: Modulation, Laser frequency, Tunable lasers, Modulation frequency, Mirrors, Frequency modulation, Thermal effects, Semiconductor lasers, Waveguides, Photonic integrated circuits

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Proceedings Article | 5 April 2007 Paper

Advances in process overlay: alignment solutions for future technology nodes

Henry Megens, Richard van Haren, Sami Musa, Maya Doytcheva, Sanjay Lalbahadoersing, Marc van Kemenade, Hyun-Woo Lee, Paul Hinnen, Frank van Bilsen

Proceedings Volume 6518, 65181Z (2007) https://doi.org/10.1117/12.712149

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Photomasks, Metrology, Polarization, Refractive index, Signal detection, Semiconductors, Lithography

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Semiconductor industry has an increasing demand for improvement of the total lithographic overlay performance. To improve the level of on-product overlay control the number of alignment measurements increases. Since more mask levels will be integrated, more alignment marks need to be printed when using direct-alignment (also called layer-to-layer alignment). Accordingly, the alignment mark size needs to become smaller, to fit all marks into the scribelane. For an in-direct alignment scheme, e.g. a scheme that aligns to another layer than the layer to which overlay is being measured, the number of needed alignment marks can be reduced. Simultaneously there is a requirement to reduce the size of alignment mark sub-segmentations without compromising the alignment and overlay performance. Smaller features within alignment marks can prevent processing issues like erosion, dishing and contamination. However, when the sub-segmentation size within an alignment mark becomes comparable to the critical dimension, and thus smaller than the alignment-illuminating wavelength, polarization effects might start to occur. Polarization effects are a challenge for optical alignment systems to maintain mark detectability. Nevertheless, this paper shows how to actually utilize those effects in order to obtain enhanced alignment and overlay performance to support future technology nodes. Finally, another challenge to be met for new semiconductor product technologies is the ability to align through semi-opaque materials, like for instance new hard-mask materials. Enhancement of alignment signal strength can be reached by adapting to new alignment marks that generate a higher alignment signal. This paper provides a description of an integral alignment solution that meets with these emerging customer application requirements. Complying with these requirements will significantly enhance the flexibility in production strategies while maintaining or improving the alignment and overlay performance. This paper describes the methodology for optimization of the alignment strategy.

Proceedings Article | 9 September 2004 Paper

Subwavelength detection with waveguides in optical recording

Sami Musa, Silvania Pereira, Joseph Braat, Frederik Fransoo, Dries van Thourhout, Roel Baets

Proceedings Volume 5380, (2004) https://doi.org/10.1117/12.556800

KEYWORDS: Waveguides, Signal detection, Optical recording, Phase measurement, Near field optics, Spatial frequencies, Diffraction, Optical discs, Integrated optics, Near field

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