Dr. Samir S. Ellwi
EUV Dev Manager at Adlyte
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | June 11, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Plasma, Tin, Extreme ultraviolet lithography, Ions, Light sources, Mirrors, Lithography, Inspection, Laser applications

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical filters, Mirrors, Contamination, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography, Coded apertures, Zirconium, Plasma, Tin

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Light sources, Metrology, Manufacturing, Inspection, Solids, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | February 28, 2009
Proc. SPIE. 7193, Solid State Lasers XVIII: Technology and Devices
KEYWORDS: Thin films, Optical lithography, Electrodes, Glasses, Coating, Laser processing, Laser applications, Nd:YAG lasers, Laser ablation, Plasma display panels

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Laser applications, Laser development, Multiplexing, Semiconductor lasers, Xenon, Diodes, Extreme ultraviolet, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | September 20, 2004
Proc. SPIE. 5448, High-Power Laser Ablation V
KEYWORDS: High power lasers, Laser development, Multiplexing, CCD cameras, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top