Dr. Sandip Halder
at IMEC
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Oxides, Etching, Metals, Dielectrics, Scanning electron microscopy, Photoresist materials, Line edge roughness

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Resistance, Printing, Monte Carlo methods, Process control, Critical dimension metrology, Dielectric breakdown

PROCEEDINGS ARTICLE | May 1, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Semiconductors, Light sources, Optical lithography, Deep ultraviolet, Modulation, Scanners, Inspection, Immersion lithography, Image contrast enhancement, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Imaging systems, Sensors, Inspection, Electron microscopes, Scanning electron microscopy, Image quality, Critical dimension metrology, Defect inspection

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Silica, Sensors, Scanners, Manufacturing, Scanning electron microscopy, Photomasks, Semiconductor manufacturing, Semiconducting wafers, Overlay metrology

Showing 5 of 17 publications
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