Prof. Sandip Kundu
at Univ of Massachusetts
SPIE Involvement:
Conference Program Committee | Author
Publications (2)

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Lithography, Calibration, Metals, Electrons, Manufacturing, Reliability, Resistance, Photomasks, Optical proximity correction, Computer aided design

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Lithography, Databases, Metals, Image segmentation, Error analysis, Monte Carlo methods, Photomasks, Line width roughness, Optical proximity correction, Yield improvement

Conference Committee Involvement (2)
VLSI Circuits and Systems II
9 May 2005 | Sevilla, Spain
Microelectronics: Design, Technology, and Packaging
10 December 2003 | Perth, Australia
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