Sandra Zheng
Process Engineer at
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Metrology, Optical lithography, Data modeling, Scanners, Scanning electron microscopy, Scatterometry, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Reticles, Lithographic illumination, Scanners, Scanning electron microscopy, Process control, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Metrology, Diffractive optical elements, Etching, Scanners, Scanning electron microscopy, Process control, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Signal detection

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Reticles, Cadmium, Image processing, Scanners, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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