Dr. Sang-Hee Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (18)

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Modulation, Data processing, Photomasks, Computer aided design

Proceedings Article | 3 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Modulation, Distortion, Image registration, Photomasks, Optical simulations, Neodymium, Vestigial sideband modulation

Proceedings Article | 16 September 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beams, Thermal effects, Finite element methods, Photomasks, Chemical analysis, Beam shaping, Chemical reactions, Critical dimension metrology, Heat flux, Vestigial sideband modulation

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Electron beam lithography, Backscatter, Scattering, Calibration, Image processing, Laser scattering, Monte Carlo methods, Photomasks, Vestigial sideband modulation, Beam controllers

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Electron beam lithography, Calibration, Error analysis, Inspection, Image registration, Photomasks, Mask making, Critical dimension metrology, Line edge roughness, Vestigial sideband modulation

Showing 5 of 18 publications
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