Sang-Hoon Han
Inspection Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (7)

Proceedings Article | 8 October 2014 Paper
Sang Hoon Han, Hong Yul Jung, Sun Pyo Lee, In-Yong Kang, Gi Sung Yoon, Dong Hoon Chung, Chan-Uk Jeon, Yulia Brand, Yair Eran, Yoad Bar-Shean, Alexander Chereshnya, Chung Ki Lyu
Proceedings Volume 9235, 92351K (2014)
KEYWORDS: Inspection, SRAF, Photomasks, Artificial intelligence, Optical proximity correction, Evolutionary algorithms, Resolution enhancement technologies, Image resolution, Optical lithography, Source mask optimization

Proceedings Article | 28 June 2013 Paper
Jihoon Na, Sang Hoon Han, Gisung Yoon, Dong Hoon Chung, Byung-Gook Kim, Chanuk Jeon, Dana Bernstein, Lior Shoval, Ido Dolev, Ofer Shopen, Ju Sang Lee, Chung ki Lyu, Seung Ryong Bae
Proceedings Volume 8701, 870115 (2013)
KEYWORDS: Photomasks, Inspection, Printing, Deep ultraviolet, Signal to noise ratio, Defect detection, Semiconducting wafers, Optical inspection, Wafer-level optics, Geometrical optics

Proceedings Article | 2 April 2011 Paper
Sang Hoon Han, Jihoon Na, Wonil Cho, Dong Hoon Chung, Chan-Uk Jeon, HanKu Cho, Dana Bernstein, Eun Young Park, Anoop Sreenath, Shmoolik Mangan
Proceedings Volume 7985, 79850V (2011)
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Signal to noise ratio, Optical inspection, Lithography, Scanners, Manufacturing, Semiconducting wafers

Proceedings Article | 29 October 2010 Paper
Dana Bernstein, Eun Young Park, Asaf Jaffe, Nir Shoshani, Ziv Parizat, Shmoolik Mangan, Sang Hoon Han, Dong Hoon Chung
Proceedings Volume 7823, 782335 (2010)
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Image enhancement, Defect detection, Optical inspection, Deep ultraviolet, Signal detection, Semiconductors

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 74882S (2009)
KEYWORDS: Inspection, SRAF, Optical proximity correction, Artificial intelligence, Defect detection, Semiconducting wafers, Photomasks, Reticles, Model-based design, Image resolution

Showing 5 of 7 publications
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