Sang-Hoon Han
Inspection Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 8 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Optical lithography, Inspection, Image resolution, Photomasks, Artificial intelligence, Source mask optimization, Optical proximity correction, SRAF, Evolutionary algorithms, Resolution enhancement technologies

Proceedings Article | 28 June 2013 Paper
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Wafer-level optics, Signal to noise ratio, Defect detection, Deep ultraviolet, Inspection, Optical inspection, Printing, Photomasks, Geometrical optics, Semiconducting wafers

Proceedings Article | 2 April 2011 Paper
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Signal to noise ratio, Lithography, Scanners, Manufacturing, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 29 October 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Semiconductors, Defect detection, Deep ultraviolet, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Signal detection

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Defect detection, Inspection, Image resolution, Photomasks, Artificial intelligence, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design

Showing 5 of 7 publications
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