Dr. Sang-Kon Kim
Visiting Professor
SPIE Involvement:
Author
Area of Expertise:
lithography process , simulation , lithography CAD , MEMS , bioMEMS
Websites:
Profile Summary

Kim, Ph.D. has been at the Human Resources Development Program for Industrialization of Bionano Fusion Technology in Hanyang Univeristy since September 2007.

He was a visting professor at the school of Information, Communications and Electronics Engineering in Catholic University of Korea for two years, 2005-2006. Kim was a team leader for Hanwha Corporation / Telecommunication company. During his two years at Hanwha Corporation / Telecommunication company, Kim spent time doing the fabrication and packaging of the 155 Mbps optical transmitter / receiver modules. During three years, April 1990 ~ January 1993, Kim spent time doing the chip testing software such as the fault simulator at the ASIC division of Samsung Electronics in Korea.

Kim received a bachelor degree in Physics from Hanyang University, Seoul, Korea, a master degree from Northeastern University, Boston, MA, United States, and a Ph.D. in Physics from Hanyang University, Korea. Kim has modeled lithography processes for computer simulation and has compared those results to the experimental results. He has the honor of a Best Academic Poster Award at the SPIE’s Microlithography Symposium Conference in 2006 and a Best Paper Prize at the 7th International Nanotech Symposium & Exhibition in Korea (NANO KOREA) in 2009.

Kim’s interesting area is lithography process, simulation, lithography CAD, MEMS, and bioMEMS.
Publications (16)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Semiconductors, Oxides, Lithography, Fin field effect transistors, Doping, Bismuth, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Stochastic processes

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Diffraction, Optical lithography, Photomasks, Entangled states, Quantum information, Quantum communications, Quantum computing, Diffraction gratings, Absorption

Proceedings Article | 31 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Nanostructures, Image processing, Ultraviolet radiation, Computer simulations, Photomasks, Directed self assembly, Picosecond phenomena, Device simulation, Molecular self-assembly

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Microelectromechanical systems, Lithography, Polymers, Image processing, Ultraviolet radiation, 3D modeling, Photoresist materials, Photomasks, Photoresist processing, 3D microstructuring

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Etching, Image processing, Photomasks, Double patterning technology, Computational lithography, Optical proximity correction, Semiconducting wafers

Showing 5 of 16 publications
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