Sangpyo Kim
Principal Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (29)

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Image processing, Scanners, Error analysis, Reliability, Image analysis, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Oxides, Deep ultraviolet, Air contamination, Scanners, Chromium, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Reticles, Metrology, Scanners, Error analysis, Ions, Manufacturing, Image registration, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Quartz, Particles, Image restoration, Chromium, Scanning electron microscopy, Photomasks, Deposition processes, Critical dimension metrology, Phase shifts

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Image processing, Chromium, Scanning electron microscopy, Transmission electron microscopy, Signal processing, Photomasks, Double patterning technology, Critical dimension metrology, Phase shifts

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Lithographic illumination, Scanners, Error analysis, Inspection, Photomasks, Critical dimension metrology, Geometrical optics, Photoresist processing, Semiconducting wafers

Showing 5 of 29 publications
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