Dr. Sangwook Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Semiconductors, Electronics, Optical lithography, Graphics processing units, Computer simulations, Optical proximity correction, Tolerancing, Communication engineering

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Diffraction, Reticles, Logic, Lenses, Wavefronts, Zernike polynomials, Photomasks, Logic devices, Binary data

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Calibration, Etching, Control systems, Scanning electron microscopy, Photomasks, Transistors, Critical dimension metrology, Performance modeling, Personal protective equipment, Instrument modeling

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Atrial fibrillation, Data modeling, Image segmentation, Scanners, Manufacturing, Printing, Photomasks, Optical proximity correction, Process modeling

PROCEEDINGS ARTICLE | March 12, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Polymers, Diffusion, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Statistical modeling, Instrument modeling

PROCEEDINGS ARTICLE | May 29, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Spatial light modulators, Image quality, Photomasks, Optical proximity correction, Convolution, Modulation transfer functions, Critical dimension metrology, Stray light, Semiconducting wafers, Stereolithography

Showing 5 of 15 publications
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