Mr. Sang-Yil Chang Profile

Sang-Yil Chang

at Synopsys Korea Inc

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Publications (1)

Proceedings Article | 15 May 2020 Presentation + Paper

An application study on the stochastic effect of EUV photons

Jongsu Kim, Hyekyoung Jue, Hyungju Ryu, Sang-Jin Kim, Joon-Soo Park, Kyoungsub Shin, Ulrich Welling, Jürgen Preuninger, Ulrich Klostermann, Hans-Jürgen Stock, Wolfgang Demmerle, Eun-Soo Jeong, Sang-Yil Chang, Jung-Hoe Choi

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

KEYWORDS: Stochastic processes, Photomasks, Data modeling, Nanoimprint lithography, Line width roughness, Calibration, Extreme ultraviolet, Photons, Scanning electron microscopy, Line edge roughness

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