Sang-Yong Yu
Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Semiconductors, Manufacturing, Control systems, Telecommunications, Process control, Photomasks, Extreme ultraviolet, Mask making, Semiconducting wafers, Wafer manufacturing

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Optical lithography, Polarization, Image quality, Photomasks, Image enhancement, Immersion lithography, Binary data, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Statistical analysis, Etching, Error analysis, Manufacturing, Chromium, Photomasks, Mask making, Molybdenum, Edge roughness

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Wafer-level optics, Lithography, Error analysis, Manufacturing, Optical testing, Transmittance, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Carbon, Lithography, Light sources, Contamination, Air contamination, Manufacturing, Inspection, Transmittance, Photomasks, Contamination control

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