Dr. Sang-il Park
at Park Systems Corp
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Polishing, Metrology, Imaging systems, Scanners, Surface roughness, Atomic force microscopy, Profiling, Semiconducting wafers, Enhanced vision, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Etching, Crystals, Silicon, Light scattering, Inspection, Atomic force microscopy, Scanning electron microscopy, Optical alignment, Semiconducting wafers, Enhanced vision

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Reticles, Scanners, Inspection, Nondestructive evaluation, Electron microscopes, Atomic force microscopy, Photomasks, Extreme ultraviolet, Atomic force microscope, Enhanced vision

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Scanners, Inspection, Image resolution, Nondestructive evaluation, Atomic force microscopy, Atomic force microscope, Optical alignment, Semiconducting wafers, Enhanced vision

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Metrology, Atomic force microscopy, Scatterometry, 3D metrology, Process control, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Scanners, Atomic force microscopy, Scanning electron microscopy, Laser scanners, Photoresist materials, Line width roughness, 3D scanning, Line edge roughness, 3D image processing

Showing 5 of 11 publications
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