Mr. Sang-Jin Kim Profile

Sang-Jin Kim

Principle Engineer at SAMSUNG Electro-Mechanics Co Ltd

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Publications (7)

Proceedings Article | 21 November 2023 Presentation + Paper

Analysis method to define photoresist resolution in EUV lithography

Yongbeom Seo, Heeyoung Go, Jinseong Lee, Taehwan Oh, Donghun Shin, Huiseob Shin, Jisun Lee, Sangjin Kim, In-sung Kim, Changmin Park

Proceedings Volume 12750, 127500B (2023) https://doi.org/10.1117/12.2687461

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes, Optical lithography, Bridges, Scanning electron microscopy, Resistance, Photoresist materials, Extreme ultraviolet, Metals

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Proceedings Article | 28 April 2023 Presentation + Paper

An investigation on the process control for the solid application of EUV MOR

Sangjin Kim, Il-Hwan Kim, Hyungju Ryu, Yongbeom Seo, Yigwon Kim, Jinhee Jang, Tae-Min Choi, Sol Jeong, Yongchul Jeong, Kyoungyong Cho, Cheolin Jang, Kyeongbeom Park, Changmin Park

Proceedings Volume 12494, 124940V (2023) https://doi.org/10.1117/12.2658345

KEYWORDS: Etching, Extreme ultraviolet lithography, Metal oxides, Coating, Chemical reactions, Process control, Extreme ultraviolet

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Proceedings Article | 28 April 2023 Presentation + Paper

Chemical approach to make the most of EUVL: stochastic effect mitigation with developer and rinse

Hyungju Ryu, Dokyeong Kwon, Jiho Song, Wongi Park, Jinseong Gwak, Haram Ko, Jiyoung Lee, Jinpyoung Kim, Kyungseok Ryu, Sungjo Hwang, Taemin Jeong, Heeyoung Go, Yigwon Kim, Kyoungyong Cho, Sangjin Kim, Changmin Park

Proceedings Volume 12494, 1249404 (2023) https://doi.org/10.1117/12.2656415

KEYWORDS: Extreme ultraviolet, Stochastic processes, Extreme ultraviolet lithography, Lithography, Optical lithography, Photoresist processing, EUV optics, Chemical composition, Semiconductors

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Proceedings Article | 15 May 2020 Presentation + Paper

An application study on the stochastic effect of EUV photons

Jongsu Kim, Hyekyoung Jue, Hyungju Ryu, Sang-Jin Kim, Joon-Soo Park, Kyoungsub Shin, Ulrich Welling, Jürgen Preuninger, Ulrich Klostermann, Hans-Jürgen Stock, Wolfgang Demmerle, Eun-Soo Jeong, Sang-Yil Chang, Jung-Hoe Choi

Proceedings Volume 11323, 113231E (2020) https://doi.org/10.1117/12.2553319

KEYWORDS: Stochastic processes, Photomasks, Data modeling, Nanoimprint lithography, Line width roughness, Calibration, Extreme ultraviolet, Photons, Scanning electron microscopy, Line edge roughness

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Proceedings Article | 28 March 2017 Presentation + Paper

The use of computational inspection to identify process window limiting hotspots and predict sub-15nm defects with high capture rate

Boo-Hyun Ham, Il-Hwan Kim, Sung-Sik Park, Sun-Young Yeo, Sang-Jin Kim, Dong-Woon Park, Joon-Soo Park, Chang-Hoon Ryu, Bo-Kyeong Son, Kyung-Bae Hwang, Jae-Min Shin, Jangho Shin, Ki-Yeop Park, Sean Park, Lei Liu, Ming-Chun Tien, Angelique Nachtwein, Marinus Jochemsen, Philip Yan, Vincent Hu, Christopher Jones

Proceedings Volume 10145, 101451P (2017) https://doi.org/10.1117/12.2257964

KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Metrology, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Metals, Defect detection, Scanners

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Proceedings Article | 21 February 2008 Paper

A novel diffractive micro-optical modulator for mobile display applications

Sang Kyeong Yun, JongHyeong Song, SeungDo An, InJae Yeo, YoonJoon Choi, YeongGyu Lee, HeungWoo Park, KyuBum Han, HaengSeok Yang, Victor Yurlov, Ihar Shyshkin, Anatoliy Lapchuk, HeeYeoun Kim, JaeWook Jang, JeHong Kyoung, JeongSuong Yang, SangKee Yoon, ChangSu Park, JongPil Cheong, YoungNam Hwang, KiSuk Woo, SeungWon Ryu, SeungWoo Lee, ChongMann Koh, YoungKi Baek, DaeHo Bae, HyunKee Lee, JaeHoon Lee, YungHo Ryu, HaeYeon Hwang, ChungMo Yang, OhkKun Lim, DongHyun Park, SeHwan An, JunHee Bae, SungMin Cho, BackSoon Go, SeokKee Hong, HoPhil Jung, SangJin Kim, KiUn Lee, JiHyun Park, JuHwan Yang, GiYoung Byun, SungHo Byun, YoungJin Cho, ChunGi Kim, JooHong Kim, SunKi Kim, SungIl Lee, WhaHyung Lee, KwanYoung Oh, SungKyung Oh, WooChul Shin, ByungKi Song, ElMostafa Bourim

Proceedings Volume 6887, 688702 (2008) https://doi.org/10.1117/12.762568

KEYWORDS: Glasses, Mirrors, Ferroelectric materials, Packaging, Metals, Laser based displays, Diffraction gratings, Modulation, Silicon, Diffraction

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Proceedings Article | 12 May 2005 Paper

Era of double exposure in 70 nm node DRAM cell

Sang-Jin Kim, Joon-Soo Park, Tae-Young Kim, Byeong-Soo Kim, Gi-Sung Yeo, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599458

KEYWORDS: Photomasks, Double patterning technology, Lithography, Lithographic illumination, Optical lithography, Critical dimension metrology, Distortion, Phase shifts, Monte Carlo methods, Personal protective equipment

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Showing 5 of 7 publications

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