Mr. Sang-Jin Kim Profile

Sang-Jin Kim

Senior Engineer at SAMSUNG Electro-Mechanics Co Ltd

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Publications (3)

Proceedings Article | 28 March 2017

The use of computational inspection to identify process window limiting hotspots and predict sub-15nm defects with high capture rate

Boo-Hyun Ham, Il-Hwan Kim, Sung-Sik Park, Sun-Young Yeo, Sang-Jin Kim, Dong-Woon Park, Joon-Soo Park, Chang-Hoon Ryu, Bo-Kyeong Son, Kyung-Bae Hwang, Jae-Min Shin, Jangho Shin, Ki-Yeop Park, Sean Park, Lei Liu, Ming-Chun Tien, Angelique Nachtwein, Marinus Jochemsen, Philip Yan, Vincent Hu, Christopher Jones

Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI

KEYWORDS: Electron beam lithography, Metrology, Defect detection, Metals, Scanners, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 21 February 2008

A novel diffractive micro-optical modulator for mobile display applications

Sang Kyeong Yun, JongHyeong Song, SeungDo An, InJae Yeo, YoonJoon Choi, YeongGyu Lee, HeungWoo Park, KyuBum Han, HaengSeok Yang, Victor Yurlov, Ihar Shyshkin, Anatoliy Lapchuk, HeeYeoun Kim, JaeWook Jang, JeHong Kyoung, JeongSuong Yang, SangKee Yoon, ChangSu Park, JongPil Cheong, YoungNam Hwang, KiSuk Woo, SeungWon Ryu, SeungWoo Lee, ChongMann Koh, YoungKi Baek, DaeHo Bae, HyunKee Lee, JaeHoon Lee, YungHo Ryu, HaeYeon Hwang, ChungMo Yang, OhkKun Lim, DongHyun Park, SeHwan An, JunHee Bae, SungMin Cho, BackSoon Go, SeokKee Hong, HoPhil Jung, SangJin Kim, KiUn Lee, JiHyun Park, JuHwan Yang, GiYoung Byun, SungHo Byun, YoungJin Cho, ChunGi Kim, JooHong Kim, SunKi Kim, SungIl Lee, WhaHyung Lee, KwanYoung Oh, SungKyung Oh, WooChul Shin, ByungKi Song, ElMostafa Bourim

Proc. SPIE. 6887, MOEMS and Miniaturized Systems VII

KEYWORDS: Packaging, Diffraction, Mirrors, Ferroelectric materials, Modulation, Metals, Glasses, Silicon, Laser based displays, Diffraction gratings

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Proceedings Article | 12 May 2005

Era of double exposure in 70 nm node DRAM cell

Sang-Jin Kim, Joon-Soo Park, Tae-Young Kim, Byeong-Soo Kim, Gi-Sung Yeo, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Distortion, Monte Carlo methods, Photomasks, Double patterning technology, Critical dimension metrology, Personal protective equipment, Phase shifts

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