Dr. Sangcheol Kim
at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 25 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Thin films, Metrology, Data modeling, Scattering, Polymers, X-rays, X-ray sources, Silicon, Reflectivity, Picosecond phenomena

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