Mr. Sanghak Lim Profile

Sanghak Lim

Pricipal Engineer at SAMSUNG SDI Co Ltd

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Publications (6)

Proceedings Article | 25 March 2019 Presentation + Paper

Development of novel thick spin-on carbon hardmask

Byeri Yoon, Seungwook Shin, Youngmin Kim, Yumi Heo, Soyeon Park, Sungho Choi, Miyeon Han, Sanghak Lim

Proceedings Volume 10960, 109601D (2019) https://doi.org/10.1117/12.2515136

KEYWORDS: Etching, Resistance, Carbon, Coating, Solids, Scanning electron microscopy, Semiconductor manufacturing, Optical properties, Optical lithography, Particles

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Proceedings Article | 27 March 2017 Paper

Study on thick film spin-on carbon hardmask

Taeho Kim, Youngmin Kim, Sunmin Hwang, Hyunsoo Lee, Miyeon Han, Sanghak Lim

Proceedings Volume 10146, 1014623 (2017) https://doi.org/10.1117/12.2257867

KEYWORDS: Carbon, Transparency, Photoresist materials, Optical alignment, Semiconducting wafers, Optical lithography, Etching, Resistance, Coating, Semiconductor manufacturing

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Proceedings Article | 27 March 2017 Presentation + Paper

Investigation on spin-on hard mask integration

Yushin Park, Seungwook Shin, Yunjun Kim, Seunghyun Kim, Jaebum Lim, Sung Hwan Kim, Hyeonil Jung, Chungheon Lee, Miyeon Han, Sanghak Lim, Jeong Yun Yu

Proceedings Volume 10146, 1014616 (2017) https://doi.org/10.1117/12.2257846

KEYWORDS: System integration, Photoresist materials, Manufacturing, Bottom antireflective coatings, Silicon, Antireflective coatings, Materials processing, Photomasks, Etching, Resistance, Carbon, Reflectivity, Optical lithography, Chemical vapor deposition, Double patterning technology, Atomic layer deposition, Plasma

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Proceedings Article | 27 March 2017 Paper

Study of flowability effect on self-planarization performance at SOC materials

Huichan Yun, Jinhyung Kim, Youjung Park, Yoona Kim, Seulgi Jeong, Jaeyeol Baek, Byeri Yoon, Sanghak Lim

Proceedings Volume 10146, 1014624 (2017) https://doi.org/10.1117/12.2257880

KEYWORDS: System on a chip, Carbon, Double patterning technology, Polymers, Etching, Resistance, Fourier transforms, Optical lithography, Optical properties, Coating

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Proceedings Article | 20 March 2012 Paper

Tunable resin reactivity of spin-on dielectric by controlling synthesis process

Kwen Woo Han, Hyun-Ji Song, Mi-Young Kim, Eun Su Park, Hui Chan Yoon, Go Eun Kim, Sang Hak Lim, Sang Kyun Kim

Proceedings Volume 8325, 83252B (2012) https://doi.org/10.1117/12.916252

KEYWORDS: Dielectrics, Silica, Semiconductors, Semiconducting wafers, Process control, Chemical vapor deposition, Polymers, Wet etching, Etching, Plasma

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Proceedings Article | 30 March 2007 Paper

Silicon-based anti-reflective spin-on hardmask materials with improved storage stability for 193-nm lithography

Sang Kyun Kim, Sang Hak Lim, Do-hyeon Kim, Sang Ran Koh, Mi-young Kim, Hui Chan Yoon, Dong Seon Uh, Jong Seob Kim, Tuwon Chang

Proceedings Volume 6519, 65190O (2007) https://doi.org/10.1117/12.711866

KEYWORDS: Silicon, Etching, Lithography, Photoresist materials, Photomasks, Polymers, Plasma, Reflectivity, Thin film coatings, Chemical vapor deposition

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Showing 5 of 6 publications

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