Sangho Lee
Executive Vice President at Kyungin Synthetic Corporation
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical lithography, Cadmium, Polymers, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Etching, Dry etching, Polymers, Resistance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resist chemistry

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Etching, Argon, Polymers, Diffusion, Cadmium sulfide, Fluorine, Semiconducting wafers, 193nm lithography, Chemically amplified resists

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Rutherfordium, Polymers, Diffusion, Coating, Scanning electron microscopy, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Oxides, Electron beams, FT-IR spectroscopy, Etching, Polymers, Chemistry, Surface roughness, Scanning electron microscopy, Photoresist processing, Semiconducting wafers

Showing 5 of 8 publications
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