Mr. Sang-Ho Yun
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Target detection, Diffraction, Metrology, Statistical analysis, Scanners, Error analysis, Manufacturing, Scanning electron microscopy, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 4, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Carbon, Lithography, Refractive index, Optical lithography, Signal attenuation, Etching, Resistance, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 4, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Scanners, Error analysis, Nondestructive evaluation, Photomasks, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

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