Dr. Sangsul Lee
at Paul Scherrer Institut
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Diffraction, Light sources, Sensors, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography, CCD image sensors

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Deep ultraviolet, Image processing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Molybdenum, Binary data, Phase shifts

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top