Sanjana Das
at Univ at Albany
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 17, 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Line width roughness, Plasma etching, Line edge roughness, Vacuum ultraviolet, Semiconducting wafers, Plasma

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