Sanjay H. Kapasi
Product Manager at KLA Texas
SPIE Involvement:
Publications (13)

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90520D (2014)
KEYWORDS: Semiconducting wafers, Data modeling, Optical proximity correction, Calibration, Optical lithography, Wafer-level optics, Scanning electron microscopy, Photomasks, Modulation, Lithography

Proceedings Article | 31 March 2014 Paper
Yang Ping, Sarah McGowan, Ying Gong, Yee Mei Foong, Jian Liu, Jianhong Qiu, Vincent Shu, Bo Yan, Jun Ye, Pengcheng Li, Hui Zhou, Taksh Pandey, Jiao Liang, Chris Aquino, Stanislas Baron, Sanjay Kapasi
Proceedings Volume 9052, 90521N (2014)
KEYWORDS: Optical proximity correction, SRAF, Source mask optimization, Resolution enhancement technologies, Molybdenum, Photomasks, Electroluminescence, Astatine, Printing, Neodymium

Proceedings Article | 31 March 2014 Paper
A. Szucs, J. Planchot, V. Farys, E. Yesilada, L. Depre, S. Kapasi, C. Gourgon, M. Besacier, O. Mouraille, F. Driessen
Proceedings Volume 9052, 905208 (2014)
KEYWORDS: 3D modeling, Calibration, Data modeling, Photomasks, Lithography, Semiconducting wafers, Scanning electron microscopy, Atomic force microscopy, Process control, Etching

Proceedings Article | 28 March 2014 Paper
Carl Babcock, Dongok Yang, Sarah McGowan, Jun Ye, Bo Yan, Jianhong Qiu, Stanislas Baron, Taksh Pandey, Sanjay Kapasi, Chris Aquino
Proceedings Volume 9053, 90530Z (2014)
KEYWORDS: Optical proximity correction, SRAF, Source mask optimization, Optical lithography, Photovoltaics, Neodymium, Lithography, Model-based design, Resolution enhancement technologies

Proceedings Article | 10 March 2010 Paper
Proceedings Volume 7640, 764033 (2010)
KEYWORDS: Performance modeling, Semiconducting wafers, Optical lithography, Oxides, Lithography, Standards development, Photomasks, Double patterning technology, Computer simulations, Polymers

Showing 5 of 13 publications
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