Sanjay H. Kapasi
Product Manager at KLA Texas
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Etching, 3D modeling, Atomic force microscopy, Scanning electron microscopy, Process control, Photomasks, Semiconducting wafers

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Electroluminescence, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Neodymium, Molybdenum, Astatine, Resolution enhancement technologies

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Data modeling, Modulation, Calibration, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 28 March 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Source mask optimization, Optical proximity correction, SRAF, Neodymium, Model-based design, Resolution enhancement technologies

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Oxides, Lithography, Optical lithography, Polymers, Computer simulations, Photomasks, Double patterning technology, Semiconducting wafers, Performance modeling, Standards development

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Seaborgium, Data modeling, Calibration, 3D modeling, Photomasks, Optical simulations, Semiconducting wafers, Performance modeling, 3D image processing, Instrument modeling

Showing 5 of 13 publications
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