Dr. Sanjay Malik
at FUJIFILM Electronic Materials USA Inc
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Transparency, Etching, Chemical species, Polymers, Resistance, Absorbance, Fluorine, Polymer thin films, Absorption

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Transparency, Etching, Chemical species, Polymers, Spectroscopy, Silicon, Silicon films, Absorbance, Semiconducting wafers

PROCEEDINGS ARTICLE | June 23, 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Dry etching, Polymers, Resistance, Photoresist materials, Silicon films, Structural design, Polymer thin films

PROCEEDINGS ARTICLE | June 11, 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Metals, Diffusion, Resistance, Reflectivity, Resolution enhancement technologies, Tin

PROCEEDINGS ARTICLE | June 11, 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Lithography, Etching, Polymers, Chemistry, Resistance, Printing, Photomasks, Plasma etching, Critical dimension metrology, Plasma

PROCEEDINGS ARTICLE | June 11, 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Lithography, Electron beam lithography, Deep ultraviolet, Quartz, Polymers, Ultraviolet radiation, Diffusion, Chromophores, NOx, Photolysis

Showing 5 of 9 publications
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