Dr. Sanjay Yedur
Product Marketing at Onto Innovation Inc
SPIE Involvement:
Author
Publications (17)

SPIE Journal Paper | 16 October 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Ellipsometry, Metrology, Data modeling, Manufacturing, Scatterometry, Critical dimension metrology, Line edge roughness, Reactive ion etching, Semiconducting wafers, Scatter measurement

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Etching, Manufacturing, Magnetism, Scatterometry, Measurement devices, Photomasks, Critical dimension metrology, Reactive ion etching, Semiconducting wafers

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Cadmium, Scanning electron microscopy, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Binary data

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Cadmium, Data modeling, Quartz, Pellicles, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Showing 5 of 17 publications
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