Dr. Sara Loi
Imaging Senior Engineer at STMicroelectronics
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 25, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Metrology, Diffractive optical elements, Data modeling, Scanners, 3D modeling, Finite element methods, Neural networks, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Scanners, Photomasks, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Monochromatic aberrations, Metrology, Lithographic illumination, Laser applications, Photomasks, Optical simulations, Critical dimension metrology, Overlay metrology, Fiber optic illuminators

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Monochromatic aberrations, Visualization, Scanners, Printing, Photomasks, Optical proximity correction, Spherical lenses, Binary data, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Scanners, Photomasks, Nanoimprint lithography, Semiconducting wafers, Binary data, Edge roughness, Resolution enhancement technologies

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top