Sarohan Park
Senior Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (16)

PROCEEDINGS ARTICLE | May 5, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Optical lithography, Contamination, Lithographic illumination, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Nanoimprint lithography, Stray light, Stochastic processes, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical parametric oscillators, Optical lithography, Scanners, Particles, Error analysis, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Semiconducting wafers, Overlay metrology, EUV optics

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Optical lithography, Image processing, Scanners, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Photoresist processing, Stochastic processes

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Diffraction, Metrology, Optical lithography, Scanning electron microscopy, Double patterning technology, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies, Diffraction gratings

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Optical lithography, Data modeling, Control systems, Distortion, Process control, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Showing 5 of 16 publications
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