Dr. Sarohan Park
Senior Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Etching, Image processing, Image analysis, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Failure analysis

Proceedings Article | 5 May 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Optical lithography, Contamination, Lithographic illumination, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Nanoimprint lithography, Stray light, Stochastic processes, Fiber optic illuminators

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical parametric oscillators, Optical lithography, Scanners, Particles, Error analysis, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Semiconducting wafers, Overlay metrology, EUV optics

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Resolution enhancement technologies

Proceedings Article | 16 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Optical lithography, Image processing, Scanners, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Photoresist processing, Stochastic processes

Showing 5 of 17 publications
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