Dr. Sarohan Park
Senior Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Extreme ultraviolet, Critical dimension metrology, Image processing, Failure analysis, Scanning electron microscopy, Image analysis

Proceedings Article | 5 May 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Nanoimprint lithography, Photomasks, Stochastic processes, Diffraction, Extreme ultraviolet lithography, Optical lithography, Lithographic illumination, Scanners, Immersion lithography, Stray light, Extreme ultraviolet, Calibration, Fiber optic illuminators, Contamination

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Optical lithography, Error analysis, Double patterning technology, EUV optics, Overlay metrology, Scanners, Particles, Optical parametric oscillators, Lithography

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Nanoimprint lithography, Lithographic illumination, Source mask optimization, Resolution enhancement technologies, Line width roughness, Stochastic processes, Scanners, Photomasks, Semiconducting wafers, Lithography, Critical dimension metrology

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Optical lithography, Photomasks, Photoresist processing, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Electroluminescence, Image processing, Stochastic processes, Scanners

Showing 5 of 17 publications
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