Sathish Veeraraghavan
Applications Development Engineer 2 at KLA Tencor Corp
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Data modeling, Scanners, Dielectrophoresis, Process control, Photomasks, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Scanners, Error analysis, Manufacturing, Distortion, Process control, Plasma enhanced chemical vapor deposition, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Metrology, Optical lithography, Etching, Scanners, Critical dimension metrology, Neodymium, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Thin films, Metrology, Optical lithography, Mechanics, Etching, Scanners, Finite element methods, Shape analysis, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Metrology, Laser range finders, Silicon, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Electronic support measures, Overlay metrology

SPIE Journal Paper | October 25, 2013
JM3 Vol. 12 Issue 04
KEYWORDS: Semiconducting wafers, Electronic support measures, Overlay metrology, Optical alignment, Silicon, Photomasks, Lithography, Laser range finders, Scanners, Metrology

Showing 5 of 11 publications
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