Satoru Nemoto
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Opacity, Etching, Resistance, Inspection, Chromium, Photomasks, Optical proximity correction, SRAF, Photoresist processing

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Thin films, Opacity, Etching, Dry etching, Image processing, Inspection, Photomasks, Mask making, Photoresist processing, Binary data

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Etching, Glasses, Diffusion, Scanning electron microscopy, Scatterometry, Photomasks, Line edge roughness, Photoresist processing, Scatter measurement, Temperature metrology

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Opacity, Etching, Quartz, Dry etching, Photomasks, Mask making, Critical dimension metrology, Photoresist processing, Binary data, Standards development

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Etching, Quartz, Chromium, Phase shift keying, Photoresist materials, Photomasks, Plasma etching, Critical dimension metrology, Plasma, Phase shifts

Showing 5 of 10 publications
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