Mr. Satoru Oishi
at Canon Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 25, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Metrology, Silicon, Inspection, Distortion, Scatterometry, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 4, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Semiconductors, Lithography, Data modeling, Control systems, Inverse problems, Signal processing, Finite element methods, Critical dimension metrology, Semiconducting wafers, Wafer testing

PROCEEDINGS ARTICLE | May 17, 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Semiconductors, Data mining, Lithography, Statistical analysis, Manufacturing, Inspection, Control systems, Process control, Mining, Data analysis

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Wafer-level optics, Semiconductors, Lithography, Data modeling, Optical testing, Finite element methods, Neural networks, Critical dimension metrology, Semiconducting wafers, Wafer testing

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