Satoru Shimura
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Statistical analysis, Monte Carlo methods, Bridges, Line width roughness, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Overlay metrology

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Semiconductors, Lithography, Reticles, Optical lithography, Statistical analysis, Data modeling, Etching, Control systems, Bridges, Line width roughness, Critical dimension metrology, Manufacturing equipment, Error control coding, Semiconducting wafers, Digital electronics, Stochastic processes, Overlay metrology

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Oxides, Lithography, Contamination, Metals, Particles, Coating, Materials processing, Photoresist materials, Extreme ultraviolet, Metallic coatings, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers, Contamination control

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Semiconductors, Optical lithography, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Process control, Wafer inspection, Plasma etching, Error control coding, Semiconducting wafers, System on a chip, Overlay metrology, Device simulation, Tin

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Defect detection, Etching, Manufacturing, Inspection, Scanning electron microscopy, Optical inspection, Thin film coatings, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Semiconductors, Molecular bridges, Coating, Manufacturing, Finite element methods, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Standards development

Showing 5 of 24 publications
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