Prof. Satoru Takahashi
Professor at Univ of Tokyo
SPIE Involvement:
Conference Program Committee | Author
Publications (23)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Edge detection, Metrology, Optical lithography, Image processing, Scanning electron microscopy, Transmission electron microscopy, Ion beams, Line width roughness, Semiconducting wafers

SPIE Journal Paper | 8 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line width roughness, Extreme ultraviolet, Fin field effect transistors, Edge detection, Semiconductors, Metrology, Ion beams, Electron microscopes, Line edge roughness, Transmission electron microscopy

Proceedings Article | 22 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Edge detection, Metrology, Fin field effect transistors, Denoising, Transmission electron microscopy, Extreme ultraviolet, Line width roughness, Line edge roughness

SPIE Journal Paper | 19 June 2017
OE Vol. 56 Issue 06
KEYWORDS: Laser optics, Laser development, Spherical lenses, Laser metrology, 3D metrology, Metrology, Optical testing, Sensors, Phase shifts

Proceedings Article | 19 April 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, CMOS sensors, Metrology, Coating, Transmission electron microscopy, 3D metrology, Line width roughness, Semiconducting wafers, Scanning transmission electron microscopy

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, CMOS sensors, Edge detection, Metrology, Electron microscopes, Transmission electron microscopy, 3D metrology, Semiconducting wafers, Scanning transmission electron microscopy

Showing 5 of 23 publications
Conference Committee Involvement (3)
Optical Technology and Measurement for Industrial Applications Conference
23 April 2019 | Yokohama, Japan
Optomechatronic Sensors and Instrumentation II
3 October 2006 | Boston, Massachusetts, United States
Optomechatronic Sensors and Instrumentation
5 December 2005 | Sapporo, Japan
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