Satoru Yamaguchi
at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 29 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Extreme ultraviolet, Image processing, Stochastic processes, Scanning electron microscopy, Semiconducting wafers, Extreme ultraviolet lithography, Process control, Lithography, Error analysis

SPIE Journal Paper | 23 July 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Critical dimension metrology, Detection and tracking algorithms, Metrology, Reliability, Process control, Image filtering

Proceedings Article | 4 April 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Directed self assembly, Epitaxy, Chemical analysis, Line width roughness, Annealing, Etching, Line edge roughness, Polymethylmethacrylate, Lithography, Edge roughness

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Edge detection, Scanning electron microscopy, Thin films, Error analysis, Critical dimension metrology, Metrology, Edge roughness, Polymer thin films, Signal detection, Directed self assembly

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Overlay metrology, Scanning electron microscopy, Semiconducting wafers, Scanners, Inspection, Optical testing, Wafer-level optics, Optical alignment, Control systems, Silicon

Showing 5 of 8 publications
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