Satoru Yamaguchi
at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 29 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Image processing, Error analysis, Scanning electron microscopy, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

SPIE Journal Paper | 23 July 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Edge detection, Metrology, Detection and tracking algorithms, Reliability, Scanning electron microscopy, Process control, Image filtering, Critical dimension metrology, Line edge roughness

Proceedings Article | 4 April 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Annealing, Line width roughness, Directed self assembly, Chemical analysis, Epitaxy, Line edge roughness, Edge roughness

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Thin films, Edge detection, Metrology, Error analysis, Scanning electron microscopy, Directed self assembly, Critical dimension metrology, Signal detection, Polymer thin films, Edge roughness

Showing 5 of 8 publications
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