Satoshi Enomoto
at Toyo Gosei Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 13 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Electron beams, Polymers, Molecules, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

Proceedings Article | 24 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Light sources, Contamination, Ultraviolet radiation, Ions, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Chemically amplified resists

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Semiconductors, Electron beam lithography, Polymethylmethacrylate, X-rays, Silicon, Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical reactions, Synchrotron radiation

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Nanotechnology, Lithography, Optical lithography, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Electron beams, Polymers, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Manganese, Neodymium, Surface conduction electron emitter displays, Absorption

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