Satoshi Kawashima
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Defect detection, Opacity, Particles, Manufacturing, Inspection, Electronic components, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Optical lithography, Optical properties, Polymers, Image segmentation, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Data modeling, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, System integration, Semiconducting wafers

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Data modeling, Inspection, Scanning electron microscopy, Photomasks, Optical simulations, Optical proximity correction, Mask making, Semiconducting wafers, Electronic design automation

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Logic, Scanning electron microscopy, Bridges, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

Showing 5 of 6 publications
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