Dr. Satoshi Nagai
at Advanced Memory Process Development Center
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | 10 October 2019
JM3 Vol. 18 Issue 04
KEYWORDS: Overlay metrology, Semiconducting wafers, Metals, Etching, Scanners, Optical filters, Extreme ultraviolet lithography, Data modeling, Metrology, Scanning electron microscopy

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Wafer-level optics, Optical filters, Metrology, Etching, Metals, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 14 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Optical lithography, Metals, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Antireflective coatings, Reflection, Calibration, Scanners, Interfaces, Scanning electron microscopy, Refraction, Photomasks, Photoresist processing

Proceedings Article | 31 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Transparency, Etching, Materials processing, Reflectivity, Photomasks, Immersion lithography, Logic devices, Photoresist processing, System on a chip

Showing 5 of 6 publications
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