Mr. Satoshi Tanaka Profile

Satoshi Tanaka

Group Manager at Gigaphoton Inc

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 10 April 2024 Poster

Maximizing availability by enhancing operational efficiency and implementing sophisticated maintenance strategies in complex ArFi light source

Shinichi Matsumoto, Satoshi Tanaka, Toshihiro Oga, Takamitsu Komaki, Katsuhiko Wakana, Takeshi Ohta, Takashi Saitou

Proceedings Volume PC12953, PC129530U (2024) https://doi.org/10.1117/12.3009846

KEYWORDS: Telecommunications, Standards development, Machine learning, Light sources, Data analysis, Speckle, Semiconductor manufacturing, Optics manufacturing, Instrument modeling, Immersion lithography

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Proceedings Article | 27 April 2023 Poster + Paper

The development of a machine learning-based excimer laser performance simulator for engineering maintenance decisions

Jacob Strock, Levi Jordan, Yuji Minegishi, Satoshi Tanaka, Katsunori Isomoto, Takeshi Asayama, Takehiko Tomonaga, Yousuke Kawagoe, Yuuki Sakou

Proceedings Volume 12496, 124962U (2023) https://doi.org/10.1117/12.2658043

KEYWORDS: Deep learning, Lithography, Data modeling, Performance modeling, Machine learning, Education and training, Excimer lasers, Device simulation

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Proceedings Article | 23 March 2020 Paper

Imaging performance enhancement by improvements of spectral performance stability and controllability on the cutting-edge

Miwa Igarashi, Hirotaka Miyamoto, Masahide Katou, Hiroaki Tsushima, Masato Moriya, Akihiko Kurosu, Hiroshi Tanaka, Satoshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 11327, 1132717 (2020) https://doi.org/10.1117/12.2551845

KEYWORDS: Diffraction gratings, Prisms, Diffraction, Actuators, Light sources, Control systems, Oscillators, Wavefronts, Beam expanders, Excimer lasers

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Multiple patterning ArF immersion lithography has been expected as the promising technology to meet tighter leading edge device requirements. To enhance the resolution and productivity for multiple-patterning application, key light source performances are spectral bandwidth stability and wavelength stability. The increased spectral bandwidth stability contributes to more precise critical dimension (CD) control and improves device yield. The increased wavelength stability can realize accurate focus and improve overlay accuracy. Our new spectral bandwidth control module improves E95 spectral bandwidth stability. The spectral bandwidth has deviations by thermal history with light source operations. It should be always controlled tightly even after a quiescent interval, such as wafer loading. In our laser system, a spectral bandwidth is controlled by adjusting the wavefront of a laser beam using a two-lens optical system within a resonator. A high speed actuator equipped the movable lens enables E95 spectral bandwidth stability to be less variation. New designs of drive mechanism suppress the lens vibration and spectral bandwidth error. This technology enables 3-sigma of E95 spectral bandwidth field average to be under 5 fm. This large shrinkage for E95 spectral bandwidth stability is the key to improve larger focus budgets for a leading edge processes. A new designed line narrowing module (LNM) improves wavelength stability. The wavelength is controlled by changing the rotation of a beam expander prism using actuator. Wavelength stability is improved further by the anti-vibration structure of the actuated prism in the LNM. The new design prism holding mechanisms reduce the mass of actuator load. This increases the stiffness of the system and suppresses the vibration of the prism rotation. New LNM reduce wavelength stability about 20%. The improvement in wavelength stability contributes to accurate focus and overlay. In addition, the lifetime of LNM is extending to reduce the Cost of Operation (CoO) and the light source downtime. A new ArF excimer laser, GT66A, maximizes device yield, process productivity and minimizes the operational costs for chipmakers.

Proceedings Article | 27 March 2019 Paper

Extremely long life excimer laser chamber technology for multi-patterning lithography

Hiroaki Tsushima, Yousuke Fujimaki, Yasuaki Kiyota, Makoto Tanaka, Takashi Itou, Takeshi Asayama, Akihiko Kurosu, Satoshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 10961, 109610X (2019) https://doi.org/10.1117/12.2515667

KEYWORDS: Electrodes, Excimer lasers, Lithography, Laser applications, Light sources, Semiconductors, Optical lithography, Semiconductor manufacturing, Semiconductor lasers, Laser development

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Proceedings Article | 16 March 2016 Paper

Development of high coherence high power 193nm laser

Satoshi Tanaka, Masaki Arakawa, Atsushi Fuchimukai, Yoichi Sasaki, Takashi Onose, Yasuhiro Kamba, Hironori Igarashi, Chen Qu, Mitsuru Tamiya, Hiroaki Oizumi, Shinji Ito, Koji Kakizaki, Hongwen Xuan, Zhigang Zhao, Yohei Kobayashi, Hakaru Mizoguchi

Proceedings Volume 9726, 972624 (2016) https://doi.org/10.1117/12.2211210

KEYWORDS: Solid state lasers, Excimer lasers, Laser systems engineering, Deep ultraviolet, Optical amplifiers, Amplifiers, Crystals, High power lasers, Semiconducting wafers, Fiber amplifiers

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SPIE Journal Paper | 29 May 2012

Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography

Junichi Fujimoto, Hakaru Mizoguchi, Tamotsu Abe, Satoshi Tanaka, Takeshi Ohta, Tsukasa Hori, Tatsuya Yanagida, Hiroaki Nakarai

JM3, Vol. 11, Issue 02, 021111, (May 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021111

KEYWORDS: Gas lasers, Extreme ultraviolet, Tin, Carbon monoxide, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Magnetism, Ions, Laser applications

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Proceedings Article | 22 September 2011 Paper

High-range laser bandwidth tuning for focus drilling

Alena Andryzhyieuskaya, John van Keulen, Tom van der Hoeff, Jeroen J. H. Linders, Michiel Kupers, Pablo Gabolde, Bart Smits, Takahito Kumazaki, Satoshi Tanaka, Hiroshi Tanaka, Junichi Fujimoto

Proceedings Volume 8167, 81671X (2011) https://doi.org/10.1117/12.898556

KEYWORDS: Semiconducting wafers, Laser drilling, Lithography, Fabry–Perot interferometers, Overlay metrology, Optical lithography, Extreme ultraviolet, Laser stabilization, Light sources, Scanners

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Proceedings Article | 23 March 2011 Paper

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography

Hiroshi Umeda, Hiroaki Tsushima, Hidenori Watanabe, Satoshi Tanaka, Masaya Yoshino, Shinich Matsumoto, Hiroshi Tanaka, Akihiko Kurosu, Yasufumi Kawasuji, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7973, 79731K (2011) https://doi.org/10.1117/12.879205

KEYWORDS: Reliability, Excimer lasers, Ecology, Immersion lithography, Double patterning technology, Laser development, Lithography, Laser applications, Light sources, High power lasers

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Proceedings Article | 10 March 2010 Paper

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

Masaya Yoshino, Hiroshi Umeda, Hiroaki Tsushima, Hidenori Watanabe, Satoshi Tanaka, Shinich Matsumoto, Takashi Onose, Hiroyuki Nogawa, Yasufumi Kawasuji, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7640, 76402A (2010) https://doi.org/10.1117/12.846337

KEYWORDS: Reliability, Double patterning technology, Excimer lasers, High power lasers, Immersion lithography, Lithography, Pulsed laser operation, Laser stabilization, Laser applications, Laser development

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Proceedings Article | 16 March 2009 Paper

Optical performance of laser light source for ArF immersion double patterning lithography tool

Katsuhiko Wakana, Hiroaki Tsushima, Shinichi Matsumoto, Masaya Yoshino, Takahito Kumazaki, Hidenori Watanabe, Takeshi Ohta, Satoshi Tanaka, Toru Suzuki, Hiroaki Nakarai, Yasufumi Kawasuji, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743J (2009) https://doi.org/10.1117/12.813476

KEYWORDS: Lithography, Light sources, Double patterning technology, Laser optics, Line edge roughness, Spatial coherence, Speckle, Temporal coherence, Immersion lithography, Critical dimension metrology

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Proceedings Article | 16 March 2009 Paper

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Hiroaki Tsushima, Masaya Yoshino, Takeshi Ohta, Takahito Kumazaki, Hidenori Watanabe, Shinichi Matsumoto, Hiroaki Nakarai, Hiroshi Umeda, Yasufumi Kawasuji, Toru Suzuki, Satoshi Tanaka, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743L (2009) https://doi.org/10.1117/12.813642

KEYWORDS: Reliability, Oscillators, Light sources, Fluorine, Laser applications, Double patterning technology, Optical amplifiers, High power lasers, Excimer lasers, Immersion lithography

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Proceedings Article | 11 April 2008 Paper

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Masaya Yoshino, Hiroaki Nakarai, Takeshi Ohta, Hitoshi Nagano, Hiroshi Umeda, Yasufumi Kawasuji, Toru Abe, Ryoichi Nohdomi, Toru Suzuki, Satoshi Tanaka, Yukio Watanabe, Taku Yamazaki, Shinji Nagai, Osamu Wakabayashi, Takashi Matsunaga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242S (2008) https://doi.org/10.1117/12.778430

KEYWORDS: Light sources, Double patterning technology, High power lasers, Laser stabilization, Power supplies, Laser applications, Oscillators, Error analysis, Excimer lasers, Laser development

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Proceedings Article | 7 March 2008 Paper

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Toru Suzuki, Satoshi Tanaka, Ryoichi Nohdomi, Masaya Yoshino, Shinichi Matsumoto, Yasufumi Kawasuji, Hiroshi Umeda, Hitoshi Nagano, Kouji Kakizaki, Hiroaki Nakarai, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242R (2008) https://doi.org/10.1117/12.778149

KEYWORDS: Semiconducting wafers, Reliability, Immersion lithography, Light sources, Laser stabilization, Metrology, High power lasers, Spectroscopy, Laser development, Laser applications

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Proceedings Article | 27 March 2007 Paper

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Hidenori Watanabe, Shigeo Komae, Satoshi Tanaka, Ryoichi Nohdomi, Taku Yamazaki, Hiroaki Nakarai, Junichi Fujimoto, Takashi Matsunaga, Takashi Saito, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652031 (2007) https://doi.org/10.1117/12.711258

KEYWORDS: Molybdenum, High power lasers, Laser systems engineering, Laser applications, Light sources, Systems modeling, Semiconductors, Lithography, Electrodes, Pulsed laser operation

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Proceedings Article | 26 March 2007 Paper

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Toru Suzuki, Kouji Kakizaki, Takashi Matsunaga, Satoshi Tanaka, Yasufumi Kawasuji, Masashi Shimbori, Masaya Yoshino, Takahito Kumazaki, Hiroshi Umeda, Hitoshi Nagano, Shinji Nagai, Youichi Sasaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652024 (2007) https://doi.org/10.1117/12.711366

KEYWORDS: Light sources, Spectroscopy, Immersion lithography, Optical proximity correction, Excimer lasers, Lithography, Scanners, Laser applications, Laser development, Critical dimension metrology

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Proceedings Article | 15 March 2006 Paper

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Satoshi Tanaka, Hiroaki Tsushima, Takanori Nakaike, Taku Yamazaki, Takashi Saito, Hitoshi Tomaru, Koji Kakizaki, Takashi Matsunaga, Toru Suzuki, Osamu Wakabayashi, Shinji Nagai, Junichi Fujimoto, Toyoharu Inoue, Hakaru Mizoguchi

Proceedings Volume 6154, 61542O (2006) https://doi.org/10.1117/12.655474

KEYWORDS: Amplifiers, Excimer lasers, Light sources, Lithography, Magnetism, Resonators, Gas lasers, Reliability, Electrodes, Optical components

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Proceedings Article | 14 September 2001 Paper

Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography

Kouji Kakizaki, Takashi Matsunaga, Yoichi Sasaki, Toyoharu Inoue, Satoshi Tanaka, Akifumi Tada, Hiroaki Taniguchi, Motohiro Arai, Tatsushi Igarashi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435656

KEYWORDS: Excimer lasers, Argon, Lithography, Electrodes, Pulsed laser operation, Laser development, Laser stabilization, Gas lasers, Laser scanners, 3D scanning

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Proceedings Article | 14 September 2001 Paper

Extremely high-NA high-throughput-scanner-compatible 4-kHz KrF excimer laser for DUV lithography

Takashi Matsunaga, Tatsuo Enami, Kouji Kakizaki, Takashi Saito, Satoshi Tanaka, Hiroaki Nakarai, Toyoharu Inoue, Tatsushi Igarashi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435703

KEYWORDS: Excimer lasers, Electrodes, Laser scanners, Lithography, 3D scanning, Chromium, Laser development, Pulsed laser operation, Light sources, Molecules

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Showing 5 of 18 publications

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