Satoshi Yusa
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Quartz, Image processing, Manufacturing, Inspection, Electronic components, Photomasks, Beam shaping, Nanoimprint lithography, Vestigial sideband modulation, Defect inspection

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Optical lithography, Image processing, Ultraviolet radiation, Manufacturing, Atomic force microscopy, Transmission electron microscopy, Photomasks, Nanoimprint lithography, Line edge roughness, Vestigial sideband modulation

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Quartz, Manufacturing, Inspection, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Beam shaping, Nanoimprint lithography, Line edge roughness, Vestigial sideband modulation

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical lithography, Image processing, Ultraviolet radiation, Manufacturing, Atomic force microscopy, Transmission electron microscopy, Photomasks, Beam shaping, Nanoimprint lithography, Vestigial sideband modulation

Proceedings Article | 20 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical lithography, Etching, Quartz, Image processing, Ultraviolet radiation, Manufacturing, Photomasks, Nanoimprint lithography, Line edge roughness, Vestigial sideband modulation

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Quartz, Ultraviolet radiation, Materials processing, Manufacturing, Photomasks, Mask making, Nanoimprint lithography, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation

Showing 5 of 17 publications
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