Dr. Saul Lee
at Canon Nanotechnologies Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Semiconductors, Lithography, Ultraviolet radiation, Particles, Inspection, Printing, Photomasks, Neodymium, Photoresist processing, Semiconducting wafers

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Sensors, Polymers, Crystals, Diffusion, Photomasks, Extreme ultraviolet lithography, Polymer thin films, Temperature metrology

SPIE Journal Paper | 1 March 2009
OE Vol. 48 Issue 03
KEYWORDS: Sensors, Pattern recognition, Optical pattern recognition, Biosensors, Detection and tracking algorithms, Optical engineering, Optical alignment, Target recognition, Luminescence, Optical lithography

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Lithography, Picture Archiving and Communication System, Photomasks, Nonlinear response, Computer simulations, Imaging systems, Photons, Electroluminescence, Photoresist developing, Absorbance

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Imaging systems, Computer simulations, Electroluminescence, Photomasks, Double patterning technology, Semiconducting wafers, Nonlinear response, Resolution enhancement technologies

Showing 5 of 6 publications
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