Dr. Saurabh Agarwal
at Intel Corp
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 15, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Calibration, Polymers, Particles, Molecules, Photoresist materials, Line edge roughness, Photoresist processing, Photoresist developing, Polymer thin films

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